New sputtering system with in situ Reflective High Energy Electron Diffraction

Diffraction

This new system used by the group of Marta Gibert allows to track the growth of complex oxide thin films with atomic precision  in real time.

The Oxide Interface Physics group around Prof. Marta Gibert has built a new sputtering system with in situ Reflective High Energy Electron Diffraction (RHEED) capabilities. This allows us to track the growth of complex oxide thin films in real time. The film thickness can be monitored with atomic precision making it a crucial tool for our future work on atomically engineered oxide superlattices. The vacuum system was built in-house by the physics mechanical and electrical workshops.

Experimental setup

Experimental setup
Left: The electron gun is installed to the growth chamber. Right: Inside the growth chamber.

 

Diffraction Patterns

Diffraction patterns
Left: SrTiO3 (111) substrate. Right:  after the growth of a La2NiMnO6 thin film
Oscillations
Intensity oscillations of the specular spot. Each oscillation represents the 2D growth of a one-unit-cell-thick layer.

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