New sputtering system with in situ Reflective High Energy Electron Diffraction
This new system used by the group of Marta Gibert allows to track the growth of complex oxide thin films with atomic precision in real time.
The Oxide Interface Physics group around Prof. Marta Gibert has built a new sputtering system with in situ Reflective High Energy Electron Diffraction (RHEED) capabilities. This allows us to track the growth of complex oxide thin films in real time. The film thickness can be monitored with atomic precision making it a crucial tool for our future work on atomically engineered oxide superlattices. The vacuum system was built in-house by the physics mechanical and electrical workshops.
Experimental setup
- Left: The electron gun is installed to the growth chamber. Right: Inside the growth chamber.
Diffraction Patterns
- Left: SrTiO3 (111) substrate. Right: after the growth of a La2NiMnO6 thin film
